Research Facilities

Overview
ALD

The core facilities in Research Center of Applied Sciences (RCAS) provide assistances for the researchers to conduct various experiments in bio-image detection, material surface analysis, components structure production and micro sample fabrication.

All instruments are located on 6th, 4th and B2 floors in Interdisciplinary Research Building for Science and Technology (IRBST). Furthermore, several public laboratories on 6th, 4th and B2 floors in IRBST are established for our members to do researches in fabrication, imaging, cell and protein.

The RCAS core facilities can be divided into three categories by features: Microscope, Materials Analysis, Micro Fabrication.

Table: The information of core facilities
Type Instruments Features Brand Model Location
Microscope Atomic force microscope Material surface analysis Bruker DM-CAFM NCTU
TKP 506
Laser scanning Confocal Spectral Microscope Bio and fluorescent sample detection Leica TCS-SP5 IRBST 4B20
Atomic force microscope Bio materials and nano components detection JPK Nano Wizard II & III IRBST B2C01
High resolution Raman microscope Fluorescence and crystallization analysis Jobin Yvon HR800 IRBST 6B08
Field emission scanning electron microscop Analysis of surface morphology and elemental analysis Nova 200 NPE 44/D8187 IRBST 4C05
Materials Analysis X-ray photo-electron spectroscope Surface and Depth Analysis of Elementals ULVAC-PHI PHI-5000 Versaprobe IRBST 4C05
Scanning Ion Microscope Surface and Depth Analysis of Molecules and Atoms ULVAC-PAI TRIFTV IRBST 4C05
Time-resolved confocal microscope for single molecule spectrometer Multi-Channel time resolve spectroscopy PicoQuant Micro Time 2000 IRBST 6B10
Variable angle spectroscopic ellipsometer Material film thickness and refractive index analysis VUV-VASE, Gen-II IRBST 6A02
Color 3D Laser Scanning Microscope Surface profile and roughness detection Keyence VK9710K S/N 2190011 IRBST 4C01
Benchtop maskless lithography system Structure production of photoresist on components Heidelberg uPG501 IRBST B2C02
Micro Fabrication Specimen Preparation Equipment Thin-film growth and etching Gated Sted SKE104005 IRBST 6A02
Focus Ion Beam Stucture production of nano components FEI NanoLab660 IRBST 4B19
Inductively coupled plasma etching system Dry and wet etching of nano components OXFORD ICP65 IRBST B2C02
Information of Core Facilities
In addition to routine maintenance every year,
we would upgrade the facilities and improve the laboratory configuration.
Moreover, we have suitable plan and management for every lab and instrument in safety considerations of research.
Type Instruments Features Brand Model Location
Microscope Atomic force microscope Material surface analysis Bruker DM-CAFM NCTU
TKP 506
Laser scanning Confocal Spectral Microscope Bio and fluorescent sample detection Leica TCS-SP5 IRBST 4B20
Atomic force microscope Bio materials and nano components detection JPK Nano Wizard II & III IRBST B2C01
High resolution Raman microscope Fluorescence and crystallization analysis Jobin Yvon HR800 IRBST 6B08
Field emission scanning electron microscop Analysis of surface morphology and elemental analysis Nova 200 NPE 44/D8187 IRBST 4C05
Materials Analysis X-ray photo-electron spectroscope Surface and Depth Analysis of Elementals ULVAC-PHI PHI-5000 Versaprobe IRBST 4C05
Scanning Ion Microscope Surface and Depth Analysis of Molecules and Atoms ULVAC-PAI TRIFTV IRBST 4C05
Time-resolved confocal microscope for single molecule spectrometer Multi-Channel time resolve spectroscopy PicoQuant Micro Time 2000 IRBST 6B10
Variable angle spectroscopic ellipsometer Material film thickness and refractive index analysis VUV-VASE, Gen-II IRBST 6A02
Color 3D Laser Scanning Microscope Surface profile and roughness detection Keyence VK9710K S/N 2190011 IRBST 4C01
Benchtop maskless lithography system Structure production of photoresist on components Heidelberg uPG501 IRBST B2C02
Micro Fabrication Specimen Preparation Equipment Thin-film growth and etching Gated Sted SKE104005 IRBST 6A02
Focus Ion Beam Stucture production of nano components FEI NanoLab660 IRBST 4B19
Inductively coupled plasma etching system Dry and wet etching of nano components OXFORD ICP65 IRBST B2C02
Micro Fabrication Lab
微製程實驗室為等級class1000的無塵室,
主要提供薄膜製程機台以協助本中心及本院同仁進行光電元件、量子元件、感測器及微流道等相關開發研究。
感應式耦合電漿蝕刻系統
Oxford ICP-RIE
  • 薄膜蝕刻種類:非金屬
  • 製程氣體:O2, CHF3
  • 蝕刻真空度:1-10 mTorr
  • 沈積時最低操作壓力:200-2000mTorr
  • 電漿產生裝置:上電極:15V
           下電極:-15V
  • 適用基板尺寸:4" wafer
  • 使用費:1000/h
電子束蒸鍍系統
Ulvac E Beam Evaporator
(for oxide)
  • 蒸鍍材料種類:氧化物
  • 蒸鍍源:可同時容納4個鍍源材料
  • 製程氣體:O2
  • 最低真空能力:~10-7 torr
  • 操作壓力:5X10-6 torr
  • 最高壓力:3X10-5 torr
  • 極限加熱溫度:150 ℃
  • 旋轉速率:15 rpm
  • 適用基板尺寸:4" wafer
  • 使用費:800/h
電子束蒸鍍系統
Ulvac E Beam Evaporator
(for metal)
  • 蒸鍍材料種類:金屬
  • 蒸鍍源:可同時容納6個鍍源材料
  • 最低真空能力:~10-7 torr
  • 操作壓力:5X10-6 torr
  • 最高壓力:3X10-5 torr
  • 極限加熱溫度:150 ℃
  • 旋轉速率:0-25 rpm
  • 適用基板尺寸:4" wafer
  • 使用費:800/h
熱蒸鍍系統
Ulvac Thermal Evaporator
  • 蒸鍍材料種類:金屬、非金屬
  • 蒸鍍源:可同時容納4個鍍源材料
        2種材料同時共蒸鍍
  • 極限壓力:~10-4 Pa
  • 操作壓力:4X10-4 Pa(3X10-6 torr)
  • 蒸鍍溫度:150 ℃
  • 旋轉速率:non
  • 適用基板尺寸:4" wafer
  • 使用費:500/h
射頻/直流濺鍍系統
RF/DC Sputter
  • 濺鍍材料種類:金屬、非金屬
  • 蒸鍍源:2 DC-gun, 1 RF-gun
        可同時1 DC 1 RF共濺鍍
  • 靶材需求:3" target
  • 製程氣體:Ar, O2
  • 極限壓力:~10-6 torr
  • 操作壓力:1-50 mTorr
  • 旋轉速率:15 rpm
  • 適用基板尺寸:4" wafer
  • 使用費:500/h
直流濺鍍系統
DC Sputter
  • 濺鍍材料種類:金屬
  • 蒸鍍源:1 DC-gun/ 2 DC-gun
  • 靶材需求:2"/3" target
  • 製程氣體:Ar
  • 極限壓力:~10-6 torr
  • 操作壓力:1-50 mTorr
  • 旋轉速率:
  • 濺鍍溫度:non/700 ℃
  • 適用基板尺寸:4" wafer
  • 使用費:500/h
奈米壓印曝光機
Mask Aligner EVG620 NT
  • 光源功率:
  • 光源波長:
  • 曝光強度:
  • 適用基板尺寸:
  • 使用費:1000/h
直寫機
Heidelberg direct writer
  • 光源功率:70mW
  • 光源波長:365nm
  • 曝光強度:
  • 適用基板尺寸:破片
           2"-5"矽晶圓
           2"-5"玻璃光罩
  • 使用費:800/h
Microscope
Observing minute structures, cells, tissues, or microorganisms at small scales.
Micro Fabrication
Manufacturing technology used for creating microscale structures and components.